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IPG Photonics releases IX-255 UV Laser Micromachining System


IPG Photonics Corp.

(508) 373-1100

IPG Photonics Corp., a provider of fiber lasers and amplifiers, introduced the IX-255 UV Laser Micromachining System.

The IX-255 is a system from IPG’s Microsystems Division for multi-purpose, research and development and small-scale production applications, according to the company. IPG’s multi-functional system can be configured with a beam energy density up to 25 Joules per square centimeter (J/cm2) for applications such as drilling ceramic materials, or with lower energy density for large-field exposures, such as conformal coating removal, insulation-stripping and annealing.

A third configuration allows the programmable selection of beam shapes for general-purpose patterning, cutting and machining of blind features.

Cleo 2013

IPG Photonics Corp.'s IX-255 UV Laser Micromachining System.

IPG’s IX-255 is a fully interlocked, Class 1 workstation built on a granite base and support structure for vibration minimization and thermal stability with dual microscope vision systems for automated part alignment and inspection, the company reports. The workstation is integrated with a proprietary ultraviolet laser. System software includes macro-building tools for fast programming and generation of automating processes for complex feature machining, while additional utilities allow complex pattern input from standard comma-separated values and drawing exchange format (DXF) files.

Applications for the IX-255 include drilling and cutting of ceramics, patterning of micro-fluidic devices and machining of low taper-angle holes in polymers. The IX-255 system can also be used in microelectronics for 3-D micromachining, glass drilling and cutting, selective material removal (exposure of contact pads) and trimming of conductors. In large-area exposure mode, the system can be used for surface annealing applications of semiconductors, electrical connectors and biomedical devices.


IX-255 application examples

To facilitate precise dose control, the IX-255 can be equipped with an optional Extended Beam Homogeniser that enhances beam uniformity while providing an increase of system throughput in large-field exposure applications, according to the company.

IPG Photonics will exhibit at the Conference on Lasers and Electro-Optics 2013, June 11-13, at the San Jose Convention Center (booth 2114) in San Jose, Calif., and at the Medical Design and Manufacturing East 2013 conference, June 18-20, at the Pennsylvania Convention Center (booth 2028) in Philadelphia.

Posted June 6, 2013.